ACU20FP
In the manufacturing process of thin film materials, traditional liquid delivery methods have the problem of limited solubility of solid precursors, resulting in insufficient material delivery and affecting production efficiency. The ACU20FP low vapor pressure mass flow controller, specially designed for thin film processes, can precisely control the delivery of solid precursors to the chemical vapor deposition (CVD) reactor.
Range: 10SCCM～250SCCM
Overview
Applications
Specifications
Dimensions
Software
The ACU20FP utilizes advanced pressure measurement and control technology to precisely control the flow rate of solid precursors, ensuring the stability and consistency of the deposition process, thereby achieving high-quality thin-film materials. Additionally, the ACU20FP offers various control methods and connection interfaces to meet diverse needs.
| Semiconductors | University Laboratories | Vacuum Coating | Optoelectronic Materials |
| Solar Energy | Chemical Manufacturing | Aerospace | Automotive Industry |
| Measurement Range | 10SCCM～250SCCM |
| Control Range | Valve Control Range 50:1 |
| Accuracy | ±1%F.S |
| Linearity | ±0.1%F.S |
| Repeatability | ±0.2%F.S |
| Temperature Coefficient | ±0.02%F.S/℃ |
| Response Time | |
| Flow Controller: <2s | |
| Digital | Profibus Protocol |
| Analog | 0～5V、4-20mA、1～5V |
| Power Supply | ±15VDC，24VDC |
| Operating Temperature | 0～50℃ |
| Operating Pressure | Pressure Drop: <0.01Mpa |
| Maximum Pressure Resistance | 3MPa/10MPa |
| Electrical Connection | DB9 Port |
| Leak Rate | 1×10-9Pa m3/S |
| Temperature Coefficient | ±0.025%F.S/℃ |
| Base Material | Stainless Steel |
| Sealing Material | Viton, Chloroprene Rubber, Nitrile Rubber |
| Connector | φ3，φ6，1/8"，1/4" |
ACU20FP Dimensional Drawing
Mass Flow Control System V5.0
